DEPOSITION OF EPITAXIAL LAYERS BY ION-BEAM METHODS

被引：16

作者：

WEISSMANTEL, C

HECHT, G

HINNEBERG, HJ

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1980年 / 17卷 / 04期

关键词：

D O I：

10.1116/1.570566

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：812 / 816

页数：5

共 27 条

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