RELAXATION OF STRAINED-LAYER SEMICONDUCTOR STRUCTURES VIA PLASTIC-FLOW - REPLY

被引:1
作者
DODSON, BW
TSAO, JY
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10.1063/1.100036
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O59 [应用物理学];
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页码:1128 / 1128
页数:1
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共 14 条
[1]  
Bean Jesse S, COMMUNICATION
[2]   RELAXATION OF STRAINED-LAYER SEMICONDUCTOR STRUCTURES VIA PLASTIC-FLOW [J].
DODSON, BW ;
TSAO, JY .
APPLIED PHYSICS LETTERS, 1987, 51 (17) :1325-1327
[3]  
DODSON BW, IN PRESS J CRYST GRO
[4]  
DODSON BW, IN PRESS PHYS REV B
[5]  
DODSON BW, 1988, APPL PHYS LETT, V52, pE852
[6]   ONE-DIMENSIONAL SIGE SUPERLATTICE GROWN BY UHV EPITAXY [J].
KASPER, E ;
HERZOG, HJ ;
KIBBEL, H .
APPLIED PHYSICS, 1975, 8 (03) :199-205
[7]   DETERMINATION OF THE CRITICAL LAYER THICKNESS OF SI1-XGEX/SI HETEROSTRUCTURES BY DIRECT OBSERVATION OF MISFIT DISLOCATIONS [J].
KOHAMA, Y ;
FUKUDA, Y ;
SEKI, M .
APPLIED PHYSICS LETTERS, 1988, 52 (05) :380-382
[8]   DEFECTS IN EPITAXIAL MULTILAYERS .1. MISFIT DISLOCATIONS [J].
MATTHEWS, JW ;
BLAKESLEE, AE .
JOURNAL OF CRYSTAL GROWTH, 1974, 27 (DEC) :118-125
[9]   DEPENDENCE OF CRITICAL THICKNESS ON GROWTH TEMPERATURE IN GEXSI1-X/SI SUPERLATTICES [J].
MILES, RH ;
MCGILL, TC ;
CHOW, PP ;
JOHNSON, DC ;
HAUENSTEIN, RJ ;
NIEH, CW ;
STRATHMAN, MD .
APPLIED PHYSICS LETTERS, 1988, 52 (11) :916-918
[10]   CORRECTION [J].
PEOPLE, R .
APPLIED PHYSICS LETTERS, 1986, 49 (04) :229-229