EXTERNAL ION SOURCES AND INJECTION LINES AT THE BONN ISOCHRONOUS CYCLOTRON

被引:1
作者
AGENA, M
EULER, K
FRANCZAK, B
HINTERBERGER, F
ROSENDAAL, HD
SCHMIDT, HU
机构
[1] Institut für Strahlen, Kernphysik der Universität Bonn
关键词
D O I
10.1109/TNS.1979.4329826
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The complex of external Ion source facilities at the Bonn Isochronous Cyclotron is described. A universal ion source of the Penning type was developed for the production of intense beams of multiply charged ions. Details of this ion source and performance figures are presented. An atomic beam polarized ion source is used for the production of polarized protons and deuterons. A modified atomic-beam polarized ion source using a superconducting solenoid ionizer is under construction. For the combined installation of the universal ion source and the polarized ion source a compact beam transport system has been developed which allows the optimum matching with the cyclotron. A buncher with triangular shaped pulses is used in order to increase the beam intensities. Ionoptical and technical details of the external beam lines and the axial injection are presented. © 1979 IEEE.
引用
收藏
页码:2156 / 2159
页数:4
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