X-RAY-LITHOGRAPHY

被引：76

作者：

HEUBERGER, A ^{[1
]}

机构：

[1] TECH UNIV BERLIN,D-1000 BERLIN 12,FED REP GER

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1988年 / 6卷 / 01期

关键词：

D O I：

10.1116/1.584026

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：107 / 121

页数：15

共 32 条

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[Anonymous], COMMUNICATION

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BETZ, H ;

HEINRICH, K ;

HEUBERGER, A ;

HUBER, H ;

OERTEL, H .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1986, 4 (01) :248-252

[3]

BETZ H, 1986, IN PRESS SEP MICR EN

[4]

BETZ H, 1983, P SOC PHOTO, V448, P83

[5] INVESTIGATIONS OF X-RAY-EXPOSURE USING PLANE SCANNING MIRRORS [J].

BIEBER, M ;

SCHEUNEMANN, HU ;

BETZ, H ;

HEUBERGER, A .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1983, 1 (04) :1271-1275

[6]

BRUNGER WH, 1983, MICROCIRCUIT ENG 83, P523

[7]

BRUNGER WH, 1986, IN PRESS SEP MICR EN

[8]

CSEPREGI L, 1984, J ELECTROCHEM SOC, V131, P2969

[9]

CULLMANN E, 1983, SPIE P, V448, P104

[10]

DOEMENS G, 1984, SIEMENS FORSCH ENTW, V13, P43

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