MODELING OF NOBLE GAS-SIH4 GAS-MIXTURE GLOW-DISCHARGE POSITIVE-COLUMN PLASMAS

被引：0
作者：
CHANG, JS
KIKUCHI, M
BEREZIN, AA
HOBSON, RM
MATSUMURA, S
TEII, S
机构：
[1] YORK UNIV,DEPT PHYS,TORONTO M3J 1P3,ON,CANADA
[2] MUSASHI INST TECHNOL,DEPT ELECT & ELECTR ENGN,TOKYO,JAPAN
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1994年 / 33卷 / 7B期
关键词：
PLASMA CHEMICAL VAPOR DEPOSITION; SILANE-ARGON; SILANE-NEON; SILANE-HELIUM MIXTURES; GLOW DISCHARGE; FREE RADICALS;
D O I：
10.1143/JJAP.33.4285
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Numerical modelling of He-SiH4, Ne-SiH4 and Ar-SiH4 gas mixture glow discharge positive column plasmas is conducted for the gas pressure from O.1 to 30 Torr, the percentage silane gas mixture in a noble gas from 0.01 to 10%, and the electron density from 10(9) to 10(13) cm(-3). The results show that the plasma parameters significantly depend on the combination of the choice of the noble gas and the silane mixture fraction.
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页码：4285 / 4291
页数：7
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