A ROBUST FABRICATION PROCESS FOR A REFRACTORY INTEGRATED SQUID GRADIOMETER

被引:7
作者
HUTSON, D
WESTON, RG
BAIN, RJP
LAWRENSON, MJ
PEGRUM, CM
POPOVA, K
SCARFONE, R
机构
[1] BULGARIAN ACAD SCI,INST ELECTR,BU-1784 SOFIA,BULGARIA
[2] UNIV PAVIA,DEPT NUCL & THEORET PHYS,I-27100 PAVIA,ITALY
基金
英国惠康基金;
关键词
D O I
10.1109/77.403044
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We describe a process used successfully to fabricate large second-order planar gradiometers with integrated DC SQUIDs on two-inch silicon wafers. All there fractory materials (Nb, Mo and SiO2) are deposited by magnetron sputtering. The Josephson junctions are based on the well-established Nb/AlOx/Nb trilayer technology. All Nb layers are patterned by Reactive Ion Etching using a procedure optimized by experimental design. Since only one gradiometer can fit on a wafer, extra care had to be taken in both the design of the device and the fabrication process to ensure that the yield was high. Excellent process latitude is achieved by sufficient built. in design margins to accommodate any tolerance difficulties during fabrication.
引用
收藏
页码:2295 / 2298
页数:4
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