THE ROLE OF A PHOTORESIST FILM ON REVERSE GAS PLASMA-ETCHING OF CHROMIUM FILMS

被引：6

作者：

YAMAZAKI, T

SUZUKI, Y

UNO, J

NAKATA, H

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 1980年 / 19卷 / 07期

关键词：

D O I：

10.1143/JJAP.19.1371

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1371 / 1376

页数：6

共 12 条

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[9]

SMITH HJ, 1976, 7TH P INT C EL ION B

[10] REVERSAL ETCHING OF CHROMIUM FILM IN GAS PLASMA [J].

YAMAZAKI, T ;

SUZUKI, Y ;

UNO, J ;

NAKATA, H .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1979, 126 (10) :1794-1798

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