FERROELECTRIC THIN-FILMS FOR ELECTRONIC APPLICATIONS

被引：222
作者：
HAERTLING, GH
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1991年 / 9卷 / 03期
关键词：
D O I：
10.1116/1.577424
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
This is a review paper on the history of ferroelectric thin films, current practices in their fabrication, characteristics of interest which relate to their use, and the application of these films to memory and electrooptic devices.
引用
收藏
页码：414 / 420
页数：7
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