ELECTROCHEMICAL-BEHAVIOR OF CU-NTA COMPLEXES

被引：0

作者：

KRISHNAN, RM

MURALIDHARAN, VS

机构：

来源：

PROCEEDINGS OF THE INDIAN ACADEMY OF SCIENCES-CHEMICAL SCIENCES | 1991年 / 103卷 / 02期

关键词：

CYCLIC VOLTAMMETRY; COPPER COMPLEXES; NITRILOTRIACETIC ACID;

D O I：

暂无

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

The deposition of copper was found to involve adsorbed monovalent copper which follows nonactivated Temkin isotherm. The presence of nitrilotriacetic acid stabilises it and the second electron transfer is slow.

引用

页码：107 / 118

页数：12