LASER-INDUCED ANISOTROPIC THERMOELECTRIC VOLTAGES IN THIN-FILMS

被引：43

作者：

GUTFELD, RJV ^{[1
]}

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HEIGHTS,NY 10598

来源：

关键词：

D O I：

10.1063/1.1654860

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：206 / 208

页数：3

共 11 条

[1] MECHANISMS OF STRESS RELIEF IN POLYCRYSTALLINE FILMS [J].

CHAUDHARI, P .

[2]

CHOPRA KL, 1969, THIN FILM PHENOMENA, pCH5

[3]

CUOMO JJ, PRIVATE COMMUNICATIO

[4]

Feinleib J., 1972, J NONCRYSTALLINE SOL, V8, P909, DOI [10.1016/0022-3093(72)90246-3, DOI 10.1016/0022-3093(72)90246-3]

[5]

GUTFELD RJV, 1972, J APPL PHYS, V43, P4688

[6]

GUTFELD RJV, 1970, OPTOELECTRONICS, V2, P215

[7] INTRINSIC STRESS IN EVAPORATED METAL FILMS [J].

KLOKHOLM, E ;

BERRY, BS .

[8]

LANKARD JR, 1969, IEEE J QUANTUM ELECT, VQE 5, P625

[9] MICROMACHINING AND IMAGE RECORDING ON THIN FILMS BY LASER BEAMS [J].

MAYDAN, D .

BELL SYSTEM TECHNICAL JOURNAL, 1971, 50 (06) :1761-+

[10]

MEYER JA, 1970, APPL PHYS LETTERS, V16, P3