The fractional coverage as a function of exposure to oxygen was measured from the intensities of various diffraction beams, and the condensation coefficient was derived at room temperature and above (up to 600 °C). An interpretation of the adsorption kinetics is proposed. No influence of the electron beam, of the ion gauge, or of the surface irregularity upon the adsorption rate was found. The results are compared with those obtained on well-defined Si(111) surfaces by other authors. © 1969.