MICROSTRUCTURE OF SIC THIN-FILMS PRODUCED ON GRAPHITE BY EXCIMER-LASER CHEMICAL-VAPOR-DEPOSITION

被引：1

|

作者：

SUZUKI, H

ARAKI, H

NODA, T

机构：

来源：

JOURNAL OF MATERIALS SCIENCE LETTERS | 1994年 / 13卷 / 01期

关键词：

D O I：

10.1007/BF00680271

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

收藏

页码：49 / 52

页数：4

相关论文

共 50 条

[21] Melting and crystallization behavior of low-pressure chemical-vapor-deposition amorphous Si films during excimer-laser annealing
Voogt, F.C. (frans.voogt@philips.com), 1600, American Institute of Physics Inc. (95):
[22] LASER-ASSISTED CHEMICAL-VAPOR-DEPOSITION OF GRAPHITE
TYNDALL, GW
HACKER, NP
CHEMISTRY OF MATERIALS, 1994, 6 (11) : 1982 - 1985
[23] PREPARATION OF SRTIO3 THIN-FILMS BY METALORGANIC CHEMICAL-VAPOR-DEPOSITION
KOBAYASHI, I
WAKAO, Y
TOMINAGA, K
OKADA, M
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1994, 33 (08): : 4680 - 4683
[24] RAMAN AND RUTHERFORD BACKSCATTERING ANALYSES OF CUBIC SIC THIN-FILMS GROWN ON SI BY VERTICAL CHEMICAL-VAPOR-DEPOSITION
FENG, ZC
TIN, CC
WILLIAMS, J
THIN SOLID FILMS, 1995, 266 (01) : 1 - 7
[25] NICKEL THIN-FILMS PREPARED BY CHEMICAL-VAPOR-DEPOSITION FROM NICKEL ACETYLACETONATE
MARUYAMA, T
TAGO, T
JOURNAL OF MATERIALS SCIENCE, 1993, 28 (19) : 5345 - 5348
[26] CHEMICAL-VAPOR-DEPOSITION OF MO THIN-FILMS FROM MO(CO)6
SHARMA, P
BOND, J
WESTMORE, T
VEAL, M
SINGMASTER, KA
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1995, 209 : 346 - CHED
[27] GROWTH OF CAS THIN-FILMS BY SOLID SOURCE METALORGANIC CHEMICAL-VAPOR-DEPOSITION
HELBING, R
BIRECKI, H
DICAROLIS, SA
FEIGELSON, RS
HISKES, R
JOURNAL OF CRYSTAL GROWTH, 1995, 146 (1-4) : 599 - 603
[28] PHOTO-ASSISTED CHEMICAL-VAPOR-DEPOSITION OF GALLIUM SULFIDE THIN-FILMS
PERNOT, PJ
BARRON, AR
CHEMICAL VAPOR DEPOSITION, 1995, 1 (03) : 75 - &
[29] ELECTROCHROMIC PROPERTIES OF MANGANESE OXIDE THIN-FILMS PREPARED BY CHEMICAL-VAPOR-DEPOSITION
MARUYAMA, T
OSAKI, Y
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1995, 142 (09) : 3137 - 3141
[30] ELECTROCHROMIC PROPERTIES OF NIOBIUM OXIDE THIN-FILMS PREPARED BY CHEMICAL-VAPOR-DEPOSITION
MARUYAMA, T
KANAGAWA, T
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1994, 141 (10) : 2868 - 2871

← 1 2 3 4 5 →