PLASMA MODIFICATION OF MICA

被引：50

作者：

PARKER, JL ^{[1
]}

CLAESSON, PM ^{[1
]}

CHO, DL ^{[1
]}

AHLBERG, A ^{[1
]}

TIDBLAD, J ^{[1
]}

BLOMBERG, E ^{[1
]}

机构：

[1] INST SURFACE CHEM,S-11486 STOCKHOLM,SWEDEN

来源：

JOURNAL OF COLLOID AND INTERFACE SCIENCE | 1990年 / 134卷 / 02期

关键词：

D O I：

10.1016/0021-9797(90)90155-H

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

When mica is exposed to a low temperature nonpolymer-forming plasma the surface structure is altered by a combination of sputtering and chemical reaction with reactive species in the plasma. The chemical composition of the surface is altered without a significant increase in surface rougness under optimal conditions. The effect of the plasma process parameters (exposure time, power, flow rate, and pressure) on the extent of surface modification has been investigated by means of ESCA and contact angel measurements. After exposure to water vapor plasma the mica surface becomes reactive to silanation with chlorosilanes in the gas phase. The durability of mica surfaces modified by plasma treatment and subsequent reaction with some chlorosilanes has been investigated. The forces between water and plasma-treated surfaces after silanation have been measured using a surface force apparatus. © 1990.

引用

页码：449 / 458

页数：10

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