CONSISTENT MODEL FOR THE HOT-CARRIER DEGRADATION IN N-CHANNEL AND P-CHANNEL MOSFETS

被引:286
作者
HEREMANS, P
BELLENS, R
GROESENEKEN, G
MAES, HE
机构
[1] Interuniv Micro-Electronies Cent, Louvain, Belg
关键词
Manuscript received April 13; 1988; revised July 10; 1988. P. Here-mans is a research assistant of the Belgian National Fund for Scientific Research. This work was supported by BTMC Alcatel within an IWONL project. The authors are with the Interuniversity Micro-Electronics Center (IMEC). Kapeldreef 75; B-3030; Leuven; Belgium. IEEE Log Number 8823785;
D O I
10.1109/16.8794
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
34
引用
收藏
页码:2194 / 2209
页数:16
相关论文
共 34 条
[1]   AVALANCHE INJECTION OF HOLES INTO SIO2 [J].
AITKEN, JM ;
YOUNG, DR .
IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 1977, 24 (06) :2128-2134
[2]  
BELLENS R, 1987, P ESS DERC BOLOGNA, P159
[3]  
BELLENS R, 1988, P IRPS, P8
[4]   AVALANCHE INJECTION INTO OXIDE IN SILICON GATE-CONTROLLED DEVICES .1. THEORY [J].
BULUCEA, C .
SOLID-STATE ELECTRONICS, 1975, 18 (04) :363-374
[5]  
CHOI JY, 1987, APPL PHYS LETT, V501, P1188
[6]  
DiMaria D.J., 1978, PHYS SIO2 ITS INTERF, P160, DOI [10.1016/B978-0-08-023049-8.50034-8, DOI 10.1016/B978-0-08-023049-8.50034-8]
[7]   HOT-ELECTRON INJECTION INTO THE OXIDE IN N-CHANNEL MOS DEVICES [J].
EITAN, B ;
FROHMANBENTCHKOWSKY, D .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1981, 28 (03) :328-340
[8]   A RELIABLE APPROACH TO CHARGE-PUMPING MEASUREMENTS IN MOS-TRANSISTORS [J].
GROESENEKEN, G ;
MAES, HE ;
BELTRAN, N ;
DEKEERSMAECKER, RF .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1984, 31 (01) :42-53
[9]   TWO-DIMENSIONAL MODELING OF LOCALLY DAMAGED SHORT-CHANNEL MOSFETS OPERATING IN THE LINEAR REGION [J].
HADDARA, H ;
CRISTOLOVEANU, S .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1987, 34 (02) :378-385
[10]   EVALUATION OF HOT CARRIER DEGRADATION OF N-CHANNEL MOSFETS WITH THE CHARGE PUMPING TECHNIQUE [J].
HEREMANS, P ;
MAES, HE ;
SAKS, N .
IEEE ELECTRON DEVICE LETTERS, 1986, 7 (07) :428-430