DIAMONDLIKE CARBON-FILM DEPOSITION USING A REACTIVE PULSED ELECTROMAGNETIC INDUCTIVE PLASMA PROCESS

被引:9
作者
EBIHARA, K [1 ]
IKEGAMI, T [1 ]
MATSUMOTO, T [1 ]
NISHIMOTO, H [1 ]
MAEDA, S [1 ]
HARADA, K [1 ]
机构
[1] DENKI KOGYO CO LTD,CHIYODA KU,TOKYO 100,JAPAN
关键词
D O I
10.1063/1.343772
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
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页码:4996 / 5000
页数:5
相关论文
共 19 条
[1]   RADIATION FROM CH4 AND C2H4 PRODUCED BY ELECTRON IMPACT [J].
AARTS, JFM ;
BEENAKKER, CI ;
DEHEER, FJ .
PHYSICA, 1971, 53 (01) :32-+
[2]   ELECTRICAL AND OPTICAL-PROPERTIES OF AMORPHOUS-CARBON PREPARED BY GLOW-DISCHARGE TECHNIQUE [J].
ANDERSON, DA .
PHILOSOPHICAL MAGAZINE, 1977, 35 (01) :17-26
[3]   HARD CARBON COATINGS WITH LOW OPTICAL-ABSORPTION [J].
DISCHLER, B ;
BUBENZER, A ;
KOIDL, P .
APPLIED PHYSICS LETTERS, 1983, 42 (08) :636-638
[4]   PREPARATION AND PROPERTIES OF HYDROGENATED AMORPHOUS-SILICON FILMS BY GLOW-DISCHARGE DECOMPOSITION OF SILANE IN CASCADE REACTORS [J].
DIXIT, PN ;
BHATTACHARYA, R ;
PANWAR, OS ;
SHAH, VV .
APPLIED PHYSICS LETTERS, 1984, 44 (10) :991-993
[5]   PULSED ELECTROMAGNETIC INDUCTIVE PLASMA-ENHANCED CHEMICAL-VAPOR DEPOSITION OF AMORPHOUS-CARBON FILMS [J].
EBIHARA, K ;
KANAZAWA, S ;
YAMAGATA, Y ;
MAEDA, S .
JOURNAL OF APPLIED PHYSICS, 1988, 64 (03) :1440-1445
[6]  
Ebihara K., 1987, Plasma Processing and Synthesis of Materials. Symposium, P249
[7]   PLASMA PROPERTIES AND THIN-FILM FORMATION IN A PULSED ELECTROMAGNETIC INDUCTIVE SILANE DISCHARGE [J].
EBIHARA, K ;
MAEDA, S .
JOURNAL OF APPLIED PHYSICS, 1985, 57 (07) :2482-2485
[8]  
EBIHARA K, 1987, 8TH P INT S PLASM CH, P1560
[9]   DEPOSITION OF HARD AND INSULATING CARBONACEOUS FILMS ON AN RF TARGET IN A BUTANE PLASMA [J].
HOLLAND, L ;
OJHA, SM .
THIN SOLID FILMS, 1976, 38 (02) :L17-L19
[10]  
KAMMERMAIER J, 1987, 8TH P INT S PLASM CH, P1542