REVERSIBLE ELECTRON-BEAM WRITING ON A SUBMICRON SCALE IN A SUPERIONIC AMORPHOUS FILM

被引：15

作者：

OLDALE, JM

ELLIOTT, SR

机构：

[1] Department of Chemistry, University of Cambridge, Cambridge CB2 1EW, Lensfield Road

来源：

APPLIED PHYSICS LETTERS | 1993年 / 63卷 / 13期

关键词：

D O I：

10.1063/1.110667

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The direct writing of patterns in amorphous silver chalcogenide materials by electron-beam exposure is reported. At sufficiently low beam-current densities, the written patterns comprise regions depleted of silver; complete hole drilling of films does not occur. The phenomenon is postulated to arise from a combination of thermal gradient and electronic excitation effects.

引用

页码：1801 / 1803

页数：3

共 8 条

[1] NANOLITHOGRAPHY USING FIELD-EMISSION AND CONVENTIONAL THERMIONIC ELECTRON SOURCES [J].