EFFECTS OF OXYGEN PARTIAL PRESSURE ON THE OXIDATION OF SILICON CARBIDE

被引:40
作者
JORGENSEN, PJ
WADSWORTH, ME
CUTLER, IB
机构
关键词
D O I
10.1111/j.1151-2916.1960.tb12983.x
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
引用
收藏
页码:209 / 212
页数:4
相关论文
共 20 条
[1]   OXIDATION OF OXYGEN-FREE HIGH CONDUCTIVITY COPPER TO CU2O [J].
BAUR, JP ;
BRIDGES, DW ;
FASSELL, WM .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1956, 103 (05) :273-281
[2]   THE OXIDATION OF SILICON AT HIGH TEMPERATURES [J].
BRODSKY, MB ;
CUBICCIOTTI, D .
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1951, 73 (07) :3497-3499
[3]  
CHALMERS B, 1953, PROGR METAL PHYSICS, V4, P97
[4]   DYNAMIC MECHANISM OF HETEROGENEOUS CATALYSIS [J].
COOK, MA ;
OBLAD, AG .
INDUSTRIAL AND ENGINEERING CHEMISTRY, 1953, 45 (07) :1456-1461
[5]  
ELMER TH, 1951, NEPA1768 DIV REP
[6]  
ENGELL HJ, 1952, METALL, V6, P285
[7]   OXIDATION BEHAVIOR OF SILICON CARBIDE [J].
ERVIN, G .
JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1958, 41 (09) :347-352
[8]   ADSORPTION KINETICS .1. THE SYSTEM OF ALKALI ATOMS ON TUNGSTEN [J].
HIGUCHI, I ;
REE, T ;
EYRING, H .
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1955, 77 (19) :4969-4975
[9]   OXIDATION OF SILICON CARBIDE [J].
JORGENSEN, PJ ;
WADSWORTH, ME ;
CUTLER, IB .
JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1959, 42 (12) :613-616
[10]  
LAMBERTSON WA, UNPUB OXIDATION SILI