MULTIPLE BEAM-SHAPING DIAPHRAGM FOR EFFICIENT EXPOSURE OF GRATINGS

被引:7
作者
ELSNER, H
HAHMANN, P
DAHM, G
KOOPS, HWP
机构
[1] TH DARMSTADT,INST HALBLEITERTECH,D-64295 DARMSTADT,GERMANY
[2] FORSCHUNGSINST DEUTSCH BUNDESPOST TELEKOM,D-64295 DARMSTADT,GERMANY
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1993年 / 11卷 / 06期
关键词
D O I
10.1116/1.586989
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The variable-shaped beam principle has some advantages over Gaussian beams in terms of throughput. The multiple beam-shaping diaphragm concept offers additional capabilities and further increase of throughput. The fabrication procedure of the diaphragm blades are described. We used the multiple beam-shaping diaphragm in ZBA 31/32 from JENOPTIK for efficient exposure of gratings with critical dimension down to 150 nm.
引用
收藏
页码:2373 / 2377
页数:5
相关论文
共 6 条
[1]  
ELSNER H, 1991, UNPUB P MICR SYST TE, P338
[2]  
NAKAYAMA Y, 1990, J VAS SCI TECHNOL B, V8, P1183
[3]  
Olschimke J., 1986, Microelectronic Engineering, V5, P405, DOI 10.1016/0167-9317(86)90070-5
[4]   RECENT ADVANCES IN ELECTRON-BEAM LITHOGRAPHY FOR THE HIGH-VOLUME PRODUCTION OF VLSI DEVICES [J].
PFEIFFER, HC .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1979, 26 (04) :663-674
[5]  
RANDALL JC, 1983, J VAC SCI TECHNOL B, V1, P1183
[6]  
WEIDNER A, 1991, MICROCIRCUIT ENG, V17, P11