PREPARATION OF THIN-FILM DIFFUSION MICROCOUPLES IN TERNARY ALLOYS

被引：2
|
作者：
MURAKAMI, M [1 ]
FONTAINE, DD [1 ]
SHIPLEY, P [1 ]
RODGERS, W [1 ]
机构：
[1] UNIV CALIF,SCH ENGN & APPL SCI,LOS ANGELES,CA 90024
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1973年 / 10卷 / 03期
关键词：
D O I：
10.1116/1.1317086
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
15
引用
收藏
页码：445 / 449
页数：5
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