LOW-TEMPERATURE MIGRATION OF SILICON IN METAL-FILMS ON SILICON SUBSTRATES STUDIED BY BACKSCATTERING TECHNIQUES

被引：24
作者：
HIRAKI, A
LUGUJJO, E
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1972年 / 9卷 / 01期
关键词：
D O I：
10.1116/1.1316540
中图分类号：
O59 [应用物理学];
学科分类号：
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页码：155 / &
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