DEVITRIFICATION OF STEAM-GROWN SILICON DIOXIDE FILMS

被引：21
|
作者：
MEEK, RL
BRAUN, RH
机构：
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1972年 / 119卷 / 11期
关键词：
D O I：
10.1149/1.2404039
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：1538 / &
相关论文
共 50 条
  • [41] SILICON INTERSTITIAL REACTIONS WITH THERMALLY GROWN SILICON DIOXIDE
    TSAMIS, C
    TSOUKALAS, D
    GUILLEMOT, N
    MICROELECTRONIC ENGINEERING, 1993, 22 (1-4) : 363 - 366
  • [42] ELECTRICAL-CONDUCTION AT ELEVATED-TEMPERATURES IN THERMALLY GROWN SILICON DIOXIDE FILMS
    MILLS, TG
    KROGER, FA
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1973, 120 (11) : 1582 - 1586
  • [43] Removal of thermally grown silicon dioxide films using water at elevated temperature and pressure
    Lehigh Univ, Bethlehem, United States
    J Electrochem Soc, 11 (3940-3944):
  • [44] Dependence of TO and LO mode frequency of thermally grown silicon dioxide films on annealing temperature
    Ishikawa, K
    Uchiyama, Y
    Ogawa, H
    Fujimura, S
    APPLIED SURFACE SCIENCE, 1997, 117 : 212 - 215
  • [45] Nanocolumnar Preferentially Oriented PSZT Thin Films Deposited on Thermally Grown Silicon Dioxide
    Sriram, S.
    Bhaskaran, M.
    Mitchell, A.
    Mitchell, D. R. G.
    Kostovski, G.
    Nanoscale Research Letters, 2009, 4 (01): : 29 - 33
  • [46] Nanocolumnar Preferentially Oriented PSZT Thin Films Deposited on Thermally Grown Silicon Dioxide
    S Sriram
    M Bhaskaran
    A Mitchell
    DRG Mitchell
    G Kostovski
    Nanoscale Research Letters, 4
  • [47] INDEX OF REFRACTION OF STEAM GROWN OXIDES ON SILICON
    TAFT, EA
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1980, 127 (04) : 993 - 994
  • [48] Ultrathin silicon dioxide films grown by photo-oxidation of silicon using 172 nm excimer lamps
    Kaliwoh, N
    Zhang, JY
    Boyd, IW
    APPLIED SURFACE SCIENCE, 2000, 168 (1-4) : 288 - 291
  • [49] METHOD FOR DETERMINATION OF SILICON-SILICON DIOXIDE INTERFACE STRESS IN THERMALLY GROWN EXTRA THIN FILMS.
    Pugacz-Muraszkiewicz, I.
    IBM technical disclosure bulletin, 1984, 27 (7 B): : 4457 - 4460
  • [50] STRESS IN SILICON DIOXIDE FILMS
    ALEXANDROVA, S
    SZEKERES, A
    CHRISTOVA, K
    PHILOSOPHICAL MAGAZINE LETTERS, 1988, 58 (01) : 33 - 36
12345