HIGH CRITICAL CURRENT DENSITIES IN YBA2CU3O7-X THIN-FILMS FORMED BY METALORGANIC CHEMICAL VAPOR-DEPOSITION AT 730-DEGREES-C

被引：45

作者：

LI, YQ ^{[1
]}

ZHAO, J ^{[1
]}

CHERN, CS ^{[1
]}

HUANG, W ^{[1
]}

KULESHA, GA ^{[1
]}

LU, P ^{[1
]}

GALLOIS, B ^{[1
]}

NORRIS, P ^{[1
]}

KEAR, B ^{[1
]}

COSANDEY, F ^{[1
]}

机构：

[1] EMCORE CORP,SOMERSET,NJ 08873

来源：

APPLIED PHYSICS LETTERS | 1991年 / 58卷 / 06期

关键词：

D O I：

10.1063/1.104557

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

YBa2Cu3O7-x superconducting thin films with a critical current density of 2.3 x 10(6) A/cm2 at 77.7 K and 0 T were prepared by a metalorganic chemical vapor deposition process. The films were formed in situ on LaAlO3 at a substrate temperature of 730-degrees-C in 2 Torr partial pressure of N2O. Resistivity and magnetic susceptibility measurements of the as-deposited films show a sharp superconducting transition temperature of 89 K with a narrow width of less than 1 K. Critical current densities were measured by the dc transport method with a patterned bridge of 120-mu-m x 40-mu-m. Both x-ray diffraction and high-resolution electron microscopy measurements indicate that films grew epitaxially with the c axis perpendicular to the surface of the substrate.

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页码：648 / 650

页数：3

相关论文

共 20 条

[11] PROCESSING TECHNIQUES FOR THE 93-K SUPERCONDUCTOR BA2YCU3O7 [J].

MURPHY, DW ;

JOHNSON, DW ;

JIN, S ;

HOWARD, RE .

SCIENCE, 1988, 241 (4868) :922-930

[12]

SCHUEGRAF KK, 1988, HDB THIN FILM DEPOSI, P276

[13]

TSURUOKA T, 1989, JPN J APPL PHYS, V28, P607

[14] HIGH CRITICAL CURRENTS IN EPITAXIAL YBA2CU3O7-X THIN-FILMS ON SILICON WITH BUFFER LAYERS [J].

WU, XD ;

INAM, A ;

HEGDE, MS ;

WILKENS, B ;

CHANG, CC ;

HWANG, DM ;

NAZAR, L ;

VENKATESAN, T ;

MIURA, S ;

MATSUBARA, S ;

MIYASAKA, Y ;

SHOHATA, N .

APPLIED PHYSICS LETTERS, 1989, 54 (08) :754-756

[15] HIGH CRITICAL-CURRENT DENSITY OF Y-BA-CU-O SUPERCONDUCTING FILMS PREPARED BY CVD [J].

YAMANE, H ;

KUROSAWA, H ;

HIRAI, T ;

WATANABE, K ;

IWASAKI, H ;

KOBAYASHI, N ;

MUTO, Y .

SUPERCONDUCTOR SCIENCE & TECHNOLOGY, 1989, 2 (02) :115-117

[16] Y-BA-CU-O SUPERCONDUCTING FILMS PREPARED ON SRTIO3 SUBSTRATES BY CHEMICAL VAPOR-DEPOSITION [J].

YAMANE, H ;

MASUMOTO, H ;

HIRAI, T ;

IWASAKI, H ;

WATANABE, K ;

KOBAYASHI, N ;

MUTO, Y ;

KUROSAWA, H .

APPLIED PHYSICS LETTERS, 1988, 53 (16) :1548-1550

[17] VUV FLUORESCENCE FOLLOWING PHOTO-DISSOCIATION OF N2O AT 193 NM [J].

ZAVELOVICH, J ;

ROTHSCHILD, M ;

GORNIK, W ;

RHODES, CK .

JOURNAL OF CHEMICAL PHYSICS, 1981, 74 (12) :6787-6791

[18] DEPOSITION OF HIGH-TC SUPERCONDUCTING Y-BA-CU-O THIN-FILMS AT LOW-TEMPERATURES USING A PLASMA-ENHANCED ORGANOMETALLIC CHEMICAL VAPOR-DEPOSITION APPROACH [J].

ZHAO, J ;

MARCY, HO ;

TONGE, LM ;

WESSELS, BW ;

MARKS, TJ ;

KANNEWURF, CR .

SOLID STATE COMMUNICATIONS, 1990, 74 (10) :1091-1094

[19] ORGANOMETALLIC CHEMICAL VAPOR-DEPOSITION OF HIGH-TC SUPERCONDUCTING FILMS USING A VOLATILE, FLUOROCARBON-BASED PRECURSOR [J].

ZHAO, J ;

DAHMEN, KH ;

MARCY, HO ;

TONGE, LM ;

MARKS, TJ ;

WESSELS, BW ;

KANNEWURF, CR .

APPLIED PHYSICS LETTERS, 1988, 53 (18) :1750-1752

[20] LOW-TEMPERATURE INSITU FORMATION OF Y-BA-CU-O HIGH-TC SUPERCONDUCTING THIN-FILMS BY PLASMA-ENHANCED METALORGANIC CHEMICAL VAPOR-DEPOSITION [J].

ZHAO, J ;

NOH, DW ;

CHERN, C ;

LI, YQ ;

NORRIS, P ;

GALLOIS, B ;

KEAR, B .

APPLIED PHYSICS LETTERS, 1990, 56 (23) :2342-2344