RESPONSE OF PHOTOGRAPHIC MATERIALS TO ELECTRONS WITH PARTICULAR REFERENCE TO ELECTRON MICROGRAPHY

被引：16

作者：

FARNELL, GC ^{[1
]}

FLINT, RB ^{[1
]}

机构：

[1] KODAK LTD,RES LABS,HARROW HA1 4TY,MIDDLESEX,ENGLAND

来源：

JOURNAL OF MICROSCOPY-OXFORD | 1973年 / 97卷 / APR期

关键词：

D O I：

10.1111/j.1365-2818.1973.tb03782.x

中图分类号：

TH742 [显微镜];

学科分类号：

摘要：

引用

页码：271 / 291

页数：21

共 50 条

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