EFFECT OF OXYGEN ADDITION TO AN ARGON GLOW-DISCHARGE PLASMA SOURCE IN ATOMIC-EMISSION SPECTROMETRY

被引:29
作者
WAGATSUMA, K
HIROKAWA, K
机构
[1] Institute for Materials Research, Tohoku University, Sendai, 980
关键词
ARGON; ATOMIC EMISSION SPECTROMETRY; GLOW-DISCHARGE EMISSION SPECTROMETRY; MIXED GASES; OXYGEN; PLASMAS;
D O I
10.1016/0003-2670(95)00007-M
中图分类号
O65 [分析化学];
学科分类号
070302 ; 081704 ;
摘要
Small amounts of oxygen gas greatly change the characteristics of the argon plasma light source in glow-discharge emission spectrometry. The influence of oxygen addition on the sputtering rate and the excitation of the analytes in the argon plasma was investigated by employing argon-oxygen binary mixed gases having well-defined compositions. Strong quenching by oxygen was observed from the intensity of the emission lines originating from the analyte element as well as the gas species. The negative effect caused by oxygen gas in analytical applications with the glow-discharge lamp should be noted.
引用
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页码:193 / 200
页数:8
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