COMPARISON OF STEP COVERAGE AND OTHER ASPECTS OF THE H2/WF6 AND SIH4/WF6 REDUCTION SCHEMES USED IN BLANKET LPCVD OF TUNGSTEN

被引：0
|
作者：
SCHMITZ, JEJ [1 ]
VANDIJK, AJM [1 ]
GRAEF, MWM [1 ]
机构：
[1] PHILIPS RES LABS,5600 JA EINDHOVEN,NETHERLANDS
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1987年 / 134卷 / 8B期
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D O I：
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中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
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页码：C477 / C477
页数：1
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