STRUCTURE AND HEAT-TREATMENT CHARACTERISTICS OF SPUTTER-DEPOSITED ALUMINA

被引：0

作者：

THORNTON, JA

CHIN, J

机构：

[1] TELIC CORP,SANTA MONICA,CA

[2] GEN ATOM CO,SAN DIEGO,CA 92138

来源：

AMERICAN CERAMIC SOCIETY BULLETIN | 1977年 / 56卷 / 05期

关键词：

D O I：

暂无

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

收藏

页码：504 / &

相关论文

共 30 条

[1] DEPOSITION AND PROPERTIES OF ALUMINUM OXIDE OBTAINED BY PYROLYTIC DECOMPOSITION OF AN ALUMINUM ALKOXIDE
ABOAF, JA
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1967, 114 (09) : 948 - &
[2] RECRYSTALLIZATION OF ANODIC ALUMINA FILMS
BARBER, DJ
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1965, 112 (11) : 1143 - &
[3] BECH AF, 1967, CORROS SCI, V7, P1
[4] ALUMINA DEPOSITION BY ACTIVATED REACTIVE EVAPORATION
BUNSHAH, RF
SCHRAMM, RJ
[J]. THIN SOLID FILMS, 1977, 40 (JAN) : 211 - 216
[5] DAHLGREN SD, 1970, METALL TRANS, V1, P3095
[6] TRANSITIONS IN VAPOR-DEPOSITED ALUMINA FROM 300 DEGREES TO 1200 DEGREES C
DRAGOO, AL
DIAMOND, JJ
[J]. JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1967, 50 (11) : 568 - &
[7] INTERFACE PROPERTIES OF SI-(SIO2)-AL2 O3 STRUCTURES
DUFFY, MT
REVESZ, AG
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1970, 117 (03) : 372 - +
[8] Durrant P. J., 1962, INTRO ADV INORGANIC, P532
[9] CHARGE STORAGE AND STOICHIOMETRY IN ELECTRON-BEAM EVAPORATED ALUMINA
EISELE, KM
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1975, 122 (01) : 148 - 152
[10] EVANS RC, 1964, INTRO CRYSTAL CHEMIS