BETA-HYDRIDE ELIMINATION-REACTION OF TRIETHYLGALLIUM ON GAAS(100) SURFACES

被引:21
作者
BUCHAN, NI [1 ]
YU, ML [1 ]
机构
[1] IBM CORP,DIV RES,TJ WATSON RES CTR,YORKTOWN HTS,NY 10598
关键词
D O I
10.1016/0039-6028(93)90691-C
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We have used a pulsed molecular beam and time-resolved mass spectrometry to Study the pyrolysis Of triethylgallium (TEGa)on GaAs(100) surfaces from room temperature to 450-degrees-C. The beta-hydride elimination pathway WhiCh produces ethylene and hydrogen competes with the direct desorption of the ethyl radicals. We have made a quantitative measure of the branching ratio and found that the beta-hydride elimination reaction is promoted by increasing the Ga/As stoichiometric ratio of the GaAs(100) surface, but becomes less important and independent of Ga coverage at higher temperatures. The beta-hydride elimination process is the rate limiting step in the desorption of ethylene and is first order in the ethyl group coverage.
引用
收藏
页码:383 / 392
页数:10
相关论文
共 26 条
[1]  
ALBERT MR, 1987, SURFACE SCI GUIDE OR, P112
[2]   THE ADSORPTION AND REACTION OF TRIETHYLGALLIUM ON GAAS(100) [J].
BANSE, BA ;
CREIGHTON, JR .
SURFACE SCIENCE, 1991, 257 (1-3) :221-229
[3]   SURFACE ORGANOMETALLIC CHEMISTRY IN THE CHEMICAL VAPOR-DEPOSITION OF ALUMINUM FILMS USING TRIISOBUTYLALUMINUM - BETA-HYDRIDE AND BETA-ALKYL ELIMINATION-REACTIONS OF SURFACE ALKYL INTERMEDIATES [J].
BENT, BE ;
NUZZO, RG ;
DUBOIS, LH .
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1989, 111 (05) :1634-1644
[4]   GALLIUM-INDUCED AND ARSENIC-INDUCED OSCILLATIONS OF INTENSITY OF REFLECTION HIGH-ENERGY ELECTRON-DIFFRACTION IN THE GROWTH OF (001) GAAS BY CHEMICAL BEAM EPITAXY [J].
CHIU, TH ;
TSANG, WT ;
CUNNINGHAM, JE .
JOURNAL OF APPLIED PHYSICS, 1987, 62 (06) :2302-2307
[5]   PHOTOEMISSION INVESTIGATION OF THE ROOM-TEMPERATURE ADSORPTION OF TRIMETHYLGALLIUM ON GAAS SURFACE [J].
CLAVERIE, P ;
UEYAMA, K ;
MAEDA, S ;
NAMBA, H ;
KURODA, H .
APPLIED PHYSICS LETTERS, 1989, 54 (08) :698-699
[6]   COMPACT PULSED MOLECULAR-BEAM SYSTEM FOR REAL-TIME REACTIVE SCATTERING FROM SOLID-SURFACES [J].
ELDRIDGE, BN ;
YU, ML .
REVIEW OF SCIENTIFIC INSTRUMENTS, 1987, 58 (06) :1014-1026
[7]  
ELSCHENBROICH C, 1979, ORGANOMETALLICS, P13
[8]   KINETICS OF ADSORPTION, DESORPTION, AND MIGRATION AT SINGLE-CRYSTAL METAL-SURFACES [J].
KING, DA .
CRC CRITICAL REVIEWS IN SOLID STATE AND MATERIALS SCIENCES, 1978, 7 (03) :167-208
[9]   MOLECULAR-BEAM INVESTIGATION OF ADSORPTION KINETICS ON BULK METAL TARGETS - NITROGEN ON TUNGSTEN [J].
KING, DA ;
WELLS, MG .
SURFACE SCIENCE, 1972, 29 (02) :454-+
[10]   INSITU MASS-SPECTROSCOPY AND THERMOGRAVIMETRIC STUDIES OF GAAS MOCVD GAS-PHASE AND SURFACE-REACTIONS [J].
LEE, PW ;
OMSTEAD, TR ;
MCKENNA, DR ;
JENSEN, KF .
JOURNAL OF CRYSTAL GROWTH, 1987, 85 (1-2) :165-174