MECHANISM OF CVD THIN-FILM SNO2 FORMATION

被引：134

作者：

GHOSHTAGORE, RN

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1978年 / 125卷 / 01期

关键词：

D O I：

10.1149/1.2131373

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：110 / 117

页数：8

共 12 条

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[6] MECHANISM OF HETEROGENEOUS DEPOSITION OF THIN FILM RUTILE [J].

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JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1970, 117 (04) :529-+

[7]

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[9] A KINETIC STUDY OF THE SYSTEM SI-SICL4 [J].

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