PHOTOELECTROCHEMICAL DEPOSITION OF MICROSCOPIC METAL-FILM PATTERNS ON SI AND GAAS

被引：54

作者：

MICHEELS, RH

DARROW, AD

RAUH, RD

机构：

来源：

APPLIED PHYSICS LETTERS | 1981年 / 39卷 / 05期

关键词：

D O I：

10.1063/1.92758

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：418 / 420

页数：3

共 12 条

[1]

Belyakov L. V., 1974, Soviet Physics - Technical Physics, V19, P837

[2] ELECTROLYTIC DEPOSITION OF THIN METAL-FILMS ON SEMICONDUCTOR SUBSTRATES [J].

BINDRA, P ;

GERISCHER, H ;

KOLB, DM .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1977, 124 (07) :1012-1018

[3]

GRENON LA, 1980, OCT FALL M EL SOC HO

[4] PHOTOELECTROCHROMIC CHARACTERISTICS OF PHOTOELECTROCHEMICAL IMAGING-SYSTEM WITH A SEMICONDUCTOR-SOLUTION (METALLIC ION) JUNCTION [J].

INOUE, T ;

FUJISHIMA, A ;

HONDA, K .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1980, 127 (07) :1582-1588

[5] PHOTOELECTROCHEMICAL IMAGING PROCESSES USING SEMICONDUCTOR ELECTRODES [J].

INOUE, T ;

FUJISHIMA, A ;

HONDA, K .

CHEMISTRY LETTERS, 1978, (11) :1197-1200

[6]

Lowenheim F.A., 1974, Modern Electroplating

[7] METAL FILMED SEMICONDUCTOR PHOTOELECTROCHEMICAL CELLS [J].

MENEZES, S ;

HELLER, A ;

MILLER, B .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1980, 127 (06) :1268-1273

[8] ORIGIN OF PHOTOCATALYTIC DEPOSITION OF NOBLE-METALS ON TIO [J].

MOLLERS, F ;

TOLLE, HJ ;

MEMMING, R .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1974, 121 (09) :1160-1167

[9]

Morrison S.R., 1980, Electrochemistry at Semiconductor and Oxidized Metal Electrodes

[10]

MORRISON SR, 1980, DOE AC0179ET23109 CO

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