ELECTROFORMING AND DIELECTRIC BREAKDOWN IN THIN ALUMINUM-OXIDE FILMS

被引：18

作者：

MORGAN, DV ^{[1
]}

HOWES, MJ ^{[1
]}

POLLARD, RD ^{[1
]}

WATERS, DGP ^{[1
]}

机构：

[1] UNIV LEEDS,DEPT ELECT & ELECTR ENG,LEEDS,YORKSHIRE,ENGLAND

来源：

THIN SOLID FILMS | 1973年 / 15卷 / 01期

关键词：

D O I：

10.1016/0040-6090(73)90210-1

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

收藏

页码：123 / 131

页数：9

相关论文

共 50 条

[21] TRAPPED OXYGEN IN ALUMINUM-OXIDE FILMS AND ITS EFFECT ON DIELECTRIC STABILITY
BERNARD, WJ
RUSSELL, PG
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1980, 127 (06) : 1256 - 1261
[22] GROWTH OF ALUMINUM-OXIDE FILMS ON ALUMINUM ACETYLACETONATE
RABINOVICH, VG
INORGANIC MATERIALS, 1981, 17 (06) : 729 - 731
[23] MICROSTRUCTURES AND MECHANICAL-PROPERTIES OF THIN-FILMS OF ALUMINUM-OXIDE
CHOU, TC
NIEH, TG
MCADAMS, SD
PHARR, GM
SCRIPTA METALLURGICA ET MATERIALIA, 1991, 25 (10): : 2203 - 2208
[24] LOW-ENERGY ION ETCHING OF ALUMINUM-OXIDE FILMS AND NATIVE ALUMINUM-OXIDE
DAY, ME
DELFINO, M
SALIMIAN, S
JOURNAL OF APPLIED PHYSICS, 1992, 72 (11) : 5467 - 5470
[25] PLASMA-INDUCED DEPOSITION OF THIN-FILMS OF ALUMINUM-OXIDE
PATSCHEIDER, J
VEPREK, S
PLASMA CHEMISTRY AND PLASMA PROCESSING, 1992, 12 (02) : 129 - 145
[26] VOIDS IN ANODIC ALUMINUM-OXIDE FILMS
ALWITT, RS
DYER, CK
NOBLE, B
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1981, 128 (03) : C74 - C75
[27] PROPERTIES OF COMPOSITE ALUMINUM-OXIDE FILMS
ALWITT, RS
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1977, 124 (03) : C100 - C100
[28] COMPOSITION OF ANODIC ALUMINUM-OXIDE FILMS
ZUDOV, AI
ZUDOVA, LA
JOURNAL OF APPLIED CHEMISTRY OF THE USSR, 1985, 58 (08): : 1764 - 1767
[29] VOIDS IN ANODIC ALUMINUM-OXIDE FILMS
ALWITT, RS
DYER, CK
NOBLE, B
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1982, 129 (04) : 711 - 717
[30] MICROPOROUS ALUMINUM-OXIDE FILMS AT ELECTRODES
MILLER, CJ
MAJDA, M
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1985, 107 (05) : 1419 - 1420

← 1 2 3 4 5 →