OBSERVATION OF A VACUUM TUNNEL GAP IN A TRANSMISSION ELECTRON-MICROSCOPE USING A MICROMECHANICAL TUNNELING MICROSCOPE

被引：37
作者：
LUTWYCHE, MI
WADA, Y
机构：
[1] Advanced Research Laboratory, Hitachi, Ltd., Hatoyama
来源：
APPLIED PHYSICS LETTERS | 1995年 / 66卷 / 21期
关键词：
D O I：
10.1063/1.113482
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
This letter reports the observation of the vacuum tunnel gap between two conductors using a high resolution transmission electron microscope. A 2.5 mm square micromachined tunneling microscope chip has been fabricated with a minimum feature size of 0.4 μm. The chip fits into a modified side-entry type transmission electron microscope holder. The tunnel gap is controlled by a purpose-built feedback controller. The micromachines work reliably during observation of the tip apex in a transmission electron microscope, allowing the voltage and current to be changed while the tunnel gap is observed.© 1995 American Institute of Physics.
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页码：2807 / 2809
页数：3
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