INFLUENCE OF CHLORIDE IONS UPON SEMICONDUCTOR PROPERTIES OF OXIDE FILMS ON COPPER AND BRASS

被引:7
作者
Pan Chuanzhi [1 ]
Yang Maizhi [2 ]
Cai Shengmin [2 ]
Zhou Guoding [3 ]
机构
[1] Zhejiang Inst Technol, Dept Chem Engn, Hangzhou, Zhejiang, Peoples R China
[2] Peking Univ, Dept Chem, Beijing 100871, Peoples R China
[3] Shanghai Inst Elect Power, Shanghai, Peoples R China
关键词
Copper; Brass; Photocurrent; Corrosion; Influence of Cl-1;
D O I
10.3866/PKU.WHXB19930117
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The photocurrent-potential relationship for copper and brass electrodes under periodic illumination was obtained during slow (6 mV center dot s(-1))) cyclic potential scans with lock-in amplifier in 0.1 molo center dot L-1) Na2B4O7 contianing variable concentration of NaCl. Only cathodic photocurrent was exhibited on photocurrent vs. potential curves in absence of or in the presence of low concentrations of chloride ion in the solution. The minimum concentration of NaCl at which an anodic photocurrent peak appeared is 7.5x10(-4)) g center dot g(-1)) for copper and 3.8x10(-3)) g center dot g(-1)) for brass. With the continuous increase of NaCl concentraton the peak area of anodic photocurrent increases and that of cathodic decreases. The appearance of anodic photocurrent peak and its magnitude on photocurrent vs. potential curve may be served as a criterion for the characterization of the corrosion extent of copper material by Cl-1.
引用
收藏
页码:99 / 102
页数:4
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