The Si3N4/TiN Interface: 7. Ti/TiN(001) Grown and Analyzed In situ using X-ray Photoelectron Spectroscopy

被引:0
作者
Haasch, Richard T. [1 ]
Patscheider, Jorg [1 ,2 ]
Hellgren, Niklas [1 ,3 ]
Petrov, Ivan [1 ]
Greene, J. E. [1 ]
机构
[1] Univ Illinois, Dept Mat Sci, Frederick Seitz Mat Res Lab, 104 S Goodwin Ave, Urbana, IL 61801 USA
[2] EMPA, Lab Nano scale Mat Sci, CH-8600 Dubendorf, Switzerland
[3] Messiah Coll, Dept Math Sci, Grantham, PA USA
来源
SURFACE SCIENCE SPECTRA | 2012年 / 19卷 / 01期
关键词
titanium nitride; titanium; magnetron sputtering; hard coating; transition metal nitride;
D O I
10.1116/11.20121007
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
X-ray photoelectron spectroscopy (XPS) was used to analyze Ti/TiN(001) bilayers grown by ultrahigh vacuum reactive magnetron sputter deposition on MgO(001), with an electrically floating substrate potential of 7 V, in mixed 1: 1 Ar/N-2 discharges maintained at a total pressure of 0.5 Pa (3.75 x 10(-3) Torr). The TiN(001) films were grown at 600 degrees C and the 4-ML- thick Ti overlayers at room temperature. XPS spectra were obtained using incident monochromatic Al K-a x-radiation at 0.83401 nm. Ti/TiN(001) Ti 2p spectra reveal reduced unscreened final-state satellite peaks compared to Ti 2p spectra obtained from uncapped TiN(001) due to increased electronic screening. (C) 2012 American Vacuum Society.
引用
收藏
页码:92 / 97
页数:6
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