AN ACCURATE METHOD TO CHECK CHEMICAL INTERFACES OF EPITAXIAL III-V-COMPOUNDS

被引:59
作者
BISARO, R
LAURENCIN, G
FRIEDERICH, A
RAZEGHI, M
机构
关键词
D O I
10.1063/1.92974
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:978 / 980
页数:3
相关论文
共 8 条
[1]   MINIMUM AL0.5GA0.5AS-GAAS HETEROJUNCTION WIDTH DETERMINED BY SPUTTER-AUGER TECHNIQUES [J].
GARNER, CM ;
SU, CY ;
SPICER, WE ;
EDWOOD, PD ;
MILLER, D ;
HARRIS, JS .
APPLIED PHYSICS LETTERS, 1979, 34 (09) :610-611
[2]  
GARNER CM, 1979, APPL PHYS LETT, V34, P335
[3]   SOME CONSIDERATIONS OF THE LIMITATIONS OF THE AUGER-DEPTH-PROFILING TECHNIQUE AS APPLIED TO SILVER METAL AND (100) SURFACES OF INDIUM-PHOSPHIDE [J].
JONES, CJ ;
KIRK, DL .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1979, 12 (06) :837-844
[4]  
MELLET R, COMMUNICATION
[5]   1.5 MU-M ROOM-TEMPERATURE PULSED OPERATION OF GAINASP-INP DOUBLE HETEROSTRUCTURE GROWN BY LP MOCVD [J].
RAZEGHI, M ;
HIRTZ, P ;
LARIVAIN, JP ;
BLONDEAU, R ;
DECREMOUX, B ;
DUCHEMIN, JP .
ELECTRONICS LETTERS, 1981, 17 (18) :643-642
[6]  
RAZEGHI M, UNPUB ELECTRON LETT
[7]   DEVELOPMENT OF SURFACE-TOPOGRAPHY DURING DEPTH PROFILING IN AUGER-ELECTRON SPECTROSCOPY [J].
SMITH, R ;
WALLS, JM .
SURFACE SCIENCE, 1979, 80 (01) :557-565
[8]   DEPTH RESOLUTION DEGRADATION OF SPUTTER-PROFILED INP-INXGA1-XASYP1-Y INTERFACES CAUSED BY CONE FORMATION [J].
WILLIAMS, RS ;
NELSON, RJ ;
SCHLIER, AR .
APPLIED PHYSICS LETTERS, 1980, 36 (10) :827-829