MIT MODULAR X-RAY SOURCE SYSTEMS FOR THE STUDY OF PLASMA DIAGNOSTICS

被引:1
|
作者
COLEMAN, JW
WENZEL, KW
PETRASSO, RD
LO, DH
LI, CK
LIERZER, JR
WEI, T
机构
来源
REVIEW OF SCIENTIFIC INSTRUMENTS | 1992年 / 63卷 / 10期
关键词
D O I
10.1063/1.1143575
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
Two new x-ray source systems are now on line at our facility. Each provides an e-beam to 25 kV. Targets are interchangeable between machines, and four x-ray detectors may be used simultaneously with a target. The gridded e-gun of the RACEHORSE system gives a 0.5-1.0-cm pulsable spot on target. The nongridded e-gun of the SCORPION system provides a 0.3-mm or smaller dc microspot on target. RACEHORSE is being used to study and characterize type-II diamond photoconductors for use in diagnosing plasmas, while SCORPION is being used to develop a slitless spectrograph using photographic film. Source design details and some RACEHORSE results are presented.
引用
收藏
页码:4834 / 4836
页数:3
相关论文
共 50 条
  • [21] Multilayer EUV/x-ray polychromators for plasma diagnostics
    Shmaenok, LA
    Platonov, YY
    Salashchenko, NN
    Sorokin, AA
    Simanovskii, DM
    Golubev, AV
    Belik, VP
    Bobashev, SV
    Bijkerk, F
    Louis, E
    Meijer, FG
    Etlicher, B
    Grudsky, AY
    JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA, 1996, 80 : 259 - 262
  • [22] MULTILAYER BICHROMATOR FOR PLASMA DIAGNOSTICS IN THE X-RAY RANGE
    SUSINI, J
    LECOMTE, D
    MARMORET, R
    MALEK, CK
    RIVOIRA, R
    X-RAY/EUV OPTICS FOR ASTRONOMY AND MICROSCOPY, 1989, 1160 : 86 - 91
  • [23] THE CHOICE OF SPECTROSCOPIC SCHEME IN X-RAY PLASMA DIAGNOSTICS
    RENNER, O
    KOPECKY, M
    CZECHOSLOVAK JOURNAL OF PHYSICS, 1990, 40 (10) : 1107 - 1116
  • [24] Thermonuclear plasma X-ray diagnostics with Compton scattering
    Portnov, DV
    Kaschuck, YA
    Krasilnikov, AV
    DIAGNOSTICS FOR EXPERIMENTAL THERMONUCLEAR FUSION REACTORS 2, 1998, : 349 - 352
  • [25] X-ray wavelength optimization of the laser plasma X-ray lithography source
    Chaker, M.
    Boily, S.
    Lafontaine, B.
    Kieffer, J.C.
    Pepin, H.
    Toubhans, I.
    Fabbro, R.
    Microelectronic Engineering, 1990, 10 (02) : 91 - 105
  • [26] A PULSED PLASMA X-RAY SOURCE FOR X-RAY-LITHOGRAPHY
    MATTHEWS, S
    DAHLBACKA, G
    STRINGFIELD, R
    COOPER, R
    SZE, H
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1982, 129 (03) : C112 - C113
  • [27] MICROLITHOGRAPHY WITH A LASER PLASMA X-RAY SOURCE
    THOUBANS, I
    FABBRO, R
    PEPIN, H
    CHAKER, M
    REVUE DE PHYSIQUE APPLIQUEE, 1989, 24 (10): : 1001 - 1006
  • [28] INTENSE PLASMA SOURCE FOR X-RAY MICROSCOPY
    GUTCHECK, RA
    MURAY, JJ
    PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS, 1981, 316 : 196 - 202
  • [29] X-RAY PLASMA SOURCE DESIGN SIMULATIONS
    CERJAN, C
    APPLIED OPTICS, 1993, 32 (34): : 6911 - 6913
  • [30] X-RAY LASER PLASMA SOURCE FOR CALIBRATION
    BENATTAR, R
    MALKA, V
    SEZEN, A
    X-RAY INSTRUMENTATION IN MEDICINE AND BIOLOGY, PLASMA PHYSICS, ASTROPHYSICS, AND SYNCHROTRON RADIATION, 1989, 1140 : 238 - 246