DIFFUSION OF FAST ELECTRONS IN PRESENCE OF AN ELECTRIC-FIELD

被引：11

作者：

BETHE, HA ^{[1
]}

JACOB, JH ^{[1
]}

机构：

[1] AVCO EVERETT RES LAB INC,EVERETT,MA 02149

来源：

PHYSICAL REVIEW A | 1977年 / 16卷 / 05期

关键词：

D O I：

10.1103/PhysRevA.16.1952

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

引用

页码：1952 / 1963

页数：12

共 24 条

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[2]

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[4] RANGE AND ENERGY DEPOSITION ENHANCEMENT OF A FAST ELECTRON-BEAM BY EXTERNAL ELECTRIC-FIELDS [J].

BOWDEN, CM ;

PERKINS, JF ;

SHATAS, RA .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1973, 10 (06) :1000-1004

[5]

BRAU CA, 1975, APPL PHYS LETT, V27, P439

[6]

CASE KM, 1967, LINEAR TRANSPORT THE, P59

[7] ATTACHMENT-DOMINATED ELECTRON-BEAM-IONIZED DISCHARGES [J].

DAUGHERTY, JD ;

MANGANO, JA ;

JACOB, JH .

APPLIED PHYSICS LETTERS, 1976, 28 (10) :581-583

[8]

DAUGHERTY JD, 1971, B AM PHYS SOC, V16, P399

[9] DISCHARGE PUMPING OF BR2 LASER [J].

EWING, JJ ;

JACOB, JH ;

MANGANO, JA ;

BROWN, HA .

APPLIED PHYSICS LETTERS, 1976, 28 (11) :656-659

[10] LASER ACTION ON SIGMA-2+1-2 -] SIGMA-2+1-2 BANDS OF KRF AND XECL [J].

EWING, JJ ;

BRAU, CA .

APPLIED PHYSICS LETTERS, 1975, 27 (06) :350-352

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