PREPARATION AND PROPERTIES OF SPUTTERED MGO/AU, MGO/AG, AND MGO/NI CERMET FILMS

被引：41

作者：

FAN, JCC ^{[1
]}

HENRICH, VE ^{[1
]}

机构：

[1] MIT, LINCOLN LAB, LEXINGTON, MA 02173 USA

来源：

JOURNAL OF APPLIED PHYSICS | 1974年 / 45卷 / 09期

关键词：

D O I：

10.1063/1.1663854

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：3742 / 3748

页数：7

共 17 条

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[6]

GLANG R, 1967, VACUUM, V17, P167, DOI 10.1016/0042-207X(67)93183-1

[7] DIFFERENTIAL SPUTTERING OF MGO/AU CERMET FILMS AND ITS APPLICATION TO HIGH-YIELD SECONDARY-ELECTRON EMITTERS [J].

HENRICH, VE ;

FAN, JCC .

SURFACE SCIENCE, 1974, 42 (01) :139-156

[8] HIGH-EFFICIENCY SECONDARY-ELECTRON EMISSION FROM SPUTTERED MGO-AU CERMETS [J].

HENRICH, VE ;

FAN, JCC .

APPLIED PHYSICS LETTERS, 1973, 23 (01) :7-8

[9] FAST, ACCURATE SECONDARY-ELECTRON YIELD MEASUREMENTS AT LOW PRIMARY ENERGIES [J].

HENRICH, VE .

REVIEW OF SCIENTIFIC INSTRUMENTS, 1973, 44 (04) :456-462

[10]

HENRICH VE, 1973, SOLID STATE RESEARCH, V2

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