ION-INDUCED SILICIDE FORMATION IN NIOBIUM THIN-FILMS

被引：99

作者：

MATTESON, S

ROTH, J

NICOLET, MA

机构：

来源：

RADIATION EFFECTS AND DEFECTS IN SOLIDS | 1979年 / 42卷 / 3-4期

关键词：

D O I：

10.1080/00337577908209140

中图分类号：

TL [原子能技术]; O571 [原子核物理学];

学科分类号：

0827 ; 082701 ;

摘要：

引用

页码：217 / 226

页数：10

共 21 条

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