A HIGH-RESOLUTION X-RAY FACILITY

被引：4
|
作者：
CHEN, H
KURIYAMA, M
机构：
[1] NBS,DIV MET,WASHINGTON,DC 20234
[2] UNIV ILLINOIS,MAT RES LAB,URBANA,IL 61801
来源：
JOURNAL OF APPLIED CRYSTALLOGRAPHY | 1981年 / 14卷 / AUG期
关键词：
D O I：
10.1107/S0021889881009369
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
引用
收藏
页码：280 / 280
页数：1
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