THERMALLY ACTIVATED POINT DEFECT MIGRATION IN COPPER

被引：99
作者：
MEECHAN, CJ
SOSIN, A
BRINKMAN, JA
机构：
来源：
PHYSICAL REVIEW | 1960年 / 120卷 / 02期
关键词：
D O I：
10.1103/PhysRev.120.411
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
引用
收藏
页码：411 / 419
页数：9
相关论文
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