FUNDAMENTAL THEORY FOR ION CONTRIBUTIONS TO RADIO-FREQUENCY DISCHARGES BETWEEN PLANAR ELECTRODES

被引：0
|
作者：
NONAKA, S
机构：
[1] Toyota Technological Institute, Tempaku Nagoya, 468
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1991年 / 30卷 / 06期
关键词：
RF DISCHARGES; ION CONTRIBUTIONS; PLASMA DENSITY DETERMINATION; THRESHOLDS;
D O I：
10.1143/JJAP.30.1266
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Ion contributions in planar radio frequency (RF) discharges were disclosed by solving a quasi-static linear Laplace equation self-consistently in the stationary state. Negative ions were also taken into consideration. As the results, the produced plasma density, threshold for an applied RF voltage and the electric field in plasma to maintain the discharges were obtained definitely. The present theory may be applicable for wide ranges of gas pressures and RF frequencies.
引用
收藏
页码：1266 / 1271
页数：6
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