SPATIAL-RESOLUTION LIMIT FOR THE INVESTIGATION OF HIGH-TC FILMS BY LOW-TEMPERATURE SCANNING ELECTRON-MICROSCOPY

被引：25
作者：
GROSS, R
HARTMANN, M
HIPLER, K
HUEBENER, RP
KOBER, F
KOELLE, D
机构：
来源：
IEEE TRANSACTIONS ON MAGNETICS | 1989年 / 25卷 / 02期
关键词：
D O I：
10.1109/20.92756
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：2250 / 2253
页数：4
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