NOTE ON SILICON OXIDE FILM THICKNESS MEASUREMENT

被引：4

|

作者：

ROBERTSON, HM

MCNAMARA, JE

WARNER, RM

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1962年 / 33卷 / 09期

关键词：

D O I：

10.1063/1.1702582

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：2909 / &

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