PULSED ELECTRON-BEAM ANNEALING ION-IMPLANTED MATERIALS - EQUIPMENT AND RESULTS

被引：2
|
作者：
LITTLE, RG
GREENWALD, AC
机构：
来源：
IEEE TRANSACTIONS ON NUCLEAR SCIENCE | 1981年 / 28卷 / 02期
关键词：
D O I：
10.1109/TNS.1981.4331513
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：1751 / 1753
页数：3
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