INTER-DIFFUSION OF TITANIUM AND GOLD - A COMPARISON OF THIN-FILMS DEPOSITED IN TECHNICAL VACUUM AND ULTRAHIGH-VACUUM

被引：20
作者：
ASHWELL, GWB
HECKINGBOTTOM, R
机构：
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1981年 / 128卷 / 03期
关键词：
D O I：
10.1149/1.2127475
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
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页码：649 / 654
页数：6
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