MICROSTRUCTURE ANALYSIS OF OHMIC CONTACTS TO GAAS

被引：2
|
作者：
KALKUR, TS
LU, YC
ARAUJO, C
机构：
[1] Microelectronics Research Laboratories, Department of Electrical Engineering, University of Colorado, Colorado Springs, 80933-7150, CO
[2] Rutgers University, Piscataway, 08855-0909, NJ
来源：
METALLURGICAL TRANSACTIONS A-PHYSICAL METALLURGY AND MATERIALS SCIENCE | 1990年 / 21卷 / 09期
关键词：
D O I：
10.1007/BF02646990
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
[No abstract available]
引用
收藏
页码：2459 / 2463
页数：5
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