REDUCTION OF EFFECTIVE SPUTTERING YIELD BY HONEYCOMB STRUCTURES

被引：10

作者：

ABE, T

OBARA, K

NAKAMURA, H

SONE, K

OHTSUKA, H

YAMADA, R

SAIDOH, M

SHIMIZU, M

机构：

来源：

JOURNAL OF NUCLEAR SCIENCE AND TECHNOLOGY | 1978年 / 15卷 / 07期

关键词：

D O I：

10.3327/jnst.15.471

中图分类号：

TL [原子能技术]; O571 [原子核物理学];

学科分类号：

0827 ; 082701 ;

摘要：

引用

页码：471 / 475

页数：5

共 9 条

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[2]

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[3]

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[7] REDUCED EROSION IN HELIUM IMPLANTED ALUMINUM COATINGS [J].

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[8]

YOSHIKAWA M, 1974, JAERIM5849

[9] REDUCTION OF ION SPUTTERING YIELD BY SPECIAL SURFACE MICROTOPOGRAPHY [J].

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CUOMO, JJ ;

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APPLIED PHYSICS LETTERS, 1977, 30 (06) :268-271

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