[1] INDIAN INST TECHNOL,DEPT PHYS & METEOROL,KHARAGPUR 721302,W BENGAL,INDIA
[2] NATL RES COUNCIL CANADA,INST MICROSTRUCT SCI,OTTAWA K1A 0R6,ONTARIO,CANADA
来源:
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
|
1993年
/
11卷
/
05期
关键词:
D O I:
10.1116/1.578636
中图分类号:
TB3 [工程材料学];
学科分类号:
0805 ;
080502 ;
摘要:
Determination of the key internal discharge parameters such as charge particle concentration, plasma potential, and electron temperature has been made for sputter deposition of superconducting YBCO films in Ar and Ar+O2 plasma using a tuned Langmuir probe technique. The plasma parameters measured from probe characteristics have been used to qualitatively explain the effect of deposition conditions on film property. The behavior of dc self-bias at the target is discussed in the light of the combined effect of O2- ion emission and Ba+ ion interaction with the target.