SMALL-ANGLE X-RAY AND NEUTRON-SCATTERING STUDIES OF PLASMA-DEPOSITED AMORPHOUS SILICON-HYDROGEN FILMS

被引:44
作者
LEADBETTER, AJ
RASHID, AAM
RICHARDSON, RM
WRIGHT, AF
KNIGHTS, JC
机构
[1] RUTHERFORD HIGH ENERGY LAB,CHILTON OX11 0QX,OXFORDSHIRE,ENGLAND
[2] XEROX CORP,PALO ALTO RES CTR,PALO ALTO,CA 94304
[3] ILL GRENOBLE,F-38042 GRENOBLE,FRANCE
关键词
D O I
10.1016/0038-1098(80)90293-8
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
引用
收藏
页码:973 / 977
页数:5
相关论文
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