ORIENTATION OF RF-SPUTTER-DEPOSITED MOS2 FILMS

被引：71
作者：
BERTRAND, PA
机构：
来源：
JOURNAL OF MATERIALS RESEARCH | 1989年 / 4卷 / 01期
关键词：
D O I：
10.1557/JMR.1989.0180
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
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页码：180 / 184
页数：5
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